Samsung looks to add its first cutting-edge High-NA EUV lithography equipment by the next quarter, fueling the industry’s semiconductors race. Samsung Comes Behind Intel & TSMC In Employing High-NA EUV Lithography Equipment, But Competition is Fierce The utilization of High-NA equipment is now seen as something “premium” for chipmakers, and we recently reported on how Intel managed to acquire five to six kits of ASML’s High-NA Extreme Ultraviolet (EUV) lithography equipment and how it looks like out of the big three semiconductor firms (TSMC, Intel & Samsung), the Korean giant is the last one to receive the next-gen EUV lithography […]
Read full article at https://wccftech.com/samsung-acquire-first-high-na-euv-lithography-machinery-next-quarter-commercial-implementation-late-2025/
