Well, it seems like China’s chipmaking capabilities are advancing rapidly, as a domestic firm has managed to develop the first e-beam lithography tool for commercial use. China’s Latest Lithography Machine Uses Electron Beams to Carve Out Wafers, But Takes Hours on a Single Output Regarding lithography equipment, China is way behind the West since it doesn’t have access to ASML’s cutting-edge equipment, which is the ultimate barrier for the nation to develop high-end chips. However, several efforts have been made by Chinese firms to introduce EUV equipment in the market, and while that would take time, it is reported (via […]
Read full article at https://wccftech.com/china-reportedly-develops-lithography-machine-with-precision-rivalling-asml-high-na-euv/